Menzerna Fast Gloss HC400 - 250ml/1L (Heavy Cut/High Gloss)

MenzernaSKU: MZ-120003

Size: 250ml
Price:
Sale price$29.99
Stock:
In stock

Description

MENZERNA - HEAVY CUT COMPOUND 400

Menzerna Fast Gloss FG400 is an innovative cut compound for automotive clear coats leaves a dazzling impression everywhere. Gets sanding marks out of the way in record time and works into the finish range - without aggressive, volatile solvents.

Menzerna Heavy Cut Compound 400 contains even more ultra fine abrasive so can now remove sanding marks up to 1200 grit whilst at the same time producing exceptional levels of gloss. We have found this to be a truly exceptional product when used by either Dual Action or Rotary polisher, quickly removing swirls and scratches even on tough paints leaving a truly exceptional level of gloss for such a correction compound.

  • More cut: Elimination of sanding marks of grit 1200 ultra fast
  • High gloss: Within one-step process creation of impeccable high gloss
  • One-step polish: Saving time due to one-step process with high abrasiveness and high gloss
  • All-purpose: Suitable for all types of clear coats

Features and Benefits

  • Water based
  • Suitable for use with DA, rotary or by hand
  • Suitable for all types of paint finish
  • Contains diminishing abrasive particles
  • No Silicone.
  • No Fillers.
  • Easy wipe off and clean up.
  • Low dusting.
  • Works with wool or foam pads.
  • Can be used as single step.
  • Available in 250ml retail and 1000ml trade sizes

    Cut: 8/10
    Gloss: 8/10

    Available in 250ml & 1000ml bottles

    Directions for use:

    • Ensure surface is clean, dry & cool to the touch
    • Apply 2-3 pea sized amounts to a medium/heavy polishing pad or lambswool pad depending on the requirements of the job
    • Place pad against paintwork & work at low speeds to spread compound
    • Work abrasives at medium speed (3-4 with a DA, 2-3 with a rotary)
    • Wipe residue with Soft microfibre towel
    • Finish can be checked using IPA Cleaner to remove all residue 

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